Physical Modeling

A key enabling technology is our capability in physical modeling of processes and equipment which allows us to accurately capture input-output behavior, and also to monitor the performance of internal, unmeasured process variables of interest. The resulting models provide valuable design and performance information about the system. The models also provide a solid basis for optimal feedback control design for the same equipment. For example, we have developed physical models of:

rapid thermal processing (RTP),
chemical mechanical planarization (CMP) systems,
silicon epitaxy chambers,
metal-oxide chemical vapor deposition (MOCVD), and
physical vapor deposition (PVD).

In each of these cases, we have developed high-fidelity models for the purpose of equipment design and optimization, and associated low-order models for feedback control design. The detailed models are based on finite-volume or finite elements methods, and are developed using both commercial and SC Solutions’ proprietary modeling software. They simulate transport processes (continuum or low pressure), chemical kinetics, thermal and mechanical stresses, etc.