Control of Sputter Process for Improved Run-to-run Repeatability

S. Ghosal, R. L. Kosut, J. L. Ebert, L. Porter, D. Brownell, and D. Wang, Control of Sputter Process for Improved Run-to-run Repeatability, S. C. Application Notes, 2000.

Download publication (application/pdf, 411.8 kB)