Semiconductor

SC Solutions provides semiconductor equipment modeling, real-time control, and intelligent processing of advanced materials. A key to our enabling technology is our physics-based modeling of systems and processes, which allows for an accurate prediction of system behavior due to configuration or component modifications. The resulting models are also suitable for use in feedback control design and subsequent development of custom controllers. The use of this technology provides our customers with a competitive technological edge thereby reducing equipment development costs and providing for rapid time-to-market. Our expertise includes:

• Rapid Thermal Processing (RTP),
• Chemical Mechanical Planarization (CMP),
• Silicon Epitaxy Chambers,
• Metal-Oxide Chemical Vapor Deposition (MOCVD),
• GMR Thin Films Manufacturing,
• High Pressure Vertical Furnace,
• Pressure/Flow Control.

A Selection of Projects

• Closed Loop Quantum Control and Quantum Information Sciences: Concepts and Implementations
• Computer-Aided Tools for Modeling, Simulation, and Control of the Deformation Processing of High performance Composites
• Modeling, Model Reduction, and Control of Plasma-Assisted Deposition Systems
• Modeling and Model-Based Control for Chemical-Mechanical Planarization
• Molecular Beam Epitaxy for III-V Thin Film Growth
• Reactor-scale Modeling of MOCVD of High-Temperature Superconductors
• Scalable Quantum Information Processing and Applications
• Virtual Integrated Prototyping for Epitaxial Growth

A Selection of Publications

• Command Shaping for MIMO Nonlinear Systems Using Iterative Learning Control with Application to an RTP System
• Control in Semiconductor Wafer Manufacturing
• Control of Sputter Process for Improved Run-to-run Repeatability
• Efficient CFD Modeling of Single Wafer Semiconductor Systems for Closed-Loop Evaluation
• Efficient CFD Modeling of Single Wafer System for Closed-Loop Evaluation
• Feedback Control of Morphology During III-V Semiconductor Growth by Molecular Beam Epitaxy
• Linear Multivariable Servomechanisms Revisited: System Type and Accuracy Trade-offs
• Model-Based Control and Virtual Sensing with Application to a Vertical Furnace
• Model-based control for chemical-mechanical planarization (CMP)
• Model-based control for semiconductor and advanced materials processing: an overview
• Model-Based Control of Fast-Ramp RTP Systems
• Model-based Control of MOCVD Rate, Uniformity and Stoichiometry
• Model-based control of rapid thermal processing for semiconductor wafers
• Modeling and Control of Distributed Thermal Systems
• Multi-Scale Model of the RF Diode Sputter Deposition of GMR Thin Films
• Optimal control of quantum gates and suppression of decoherence in a system of interacting two-level particles
• Run-to-Run Control of Static Systems
• Silicon Epitaxy White Paper
• Tradeoffs in Temperature Control of Fast-Ramp RTO and RTA Systems