Research Publications by Industry
Below is a list of all research publications sorted by industry. Alternatively, browse the lists of all publications by industry (research and non-research).
Advanced Materials
| An All-Digital Cantilever Controller for MRFM and Scanned Probe Microscopy using a Combined DSP/FPGA Design | |
|
D. de Roover, L. Porter II, A. Emami-Naeini, J. Marohn, S. Kuehn, S. Garner, and D. Smith, An All-Digital Cantilever Controller for MRFM and Scanned Probe Microscopy using a Combined DSP/FPGA Design, NanoTech 2007: NSTI Nanotechnology Conference and Trade Show, Santa Clara, May 20-24, 2007. |
| Multiscale Modeling and Control of RF Diode Sputter Deposition for GMR Thin Films | |
|
S. Ghosal, R. L. Kosut, J. L. Ebert, and L. L. Porter II, Multiscale Modeling and Control of RF Diode Sputter Deposition for GMR Thin Films, Proceedings of the 2004 American Control Conference, 30 June-2 July 2004, Volume: 5, pp. 3930-3941, 2004. |
| Model-based control for chemical-mechanical planarization (CMP) | |
|
de Roover, D.; Emami-Naeini, A.; Ebert, J.L., Model-based control for chemical-mechanical planarization (CMP), Proceedings of the 2004 American Control Conference, Volume 5, 30 June-2 July 2004, pp. 3922-3929, 2004. |
| Modeling and Control of Distributed Thermal Systems | |
|
A. Emami-Naeini, J. L. Ebert, D. de Roover, R. L. Kosut, M. Dettori, L. M. Porter, S. Ghosal, Modeling and control of distributed thermal systems, IEEE Transactions on Control Systems Technology, Volume 11, Issue 5, Page(s):668 - 683, Sept. 2003. |
| Multi-Scale Model of the RF Diode Sputter Deposition of GMR Thin Films | |
|
S. Ghosal, R. L. Kosut, J. L. Ebert, A. Kozak, T. E. Abrahamson, W. Zou, X. W. Zhou, J. F. Groves, Y. G. Yang, H. N. G. Wadley, D. Brownell, and D. Wang, Multi-Scale Model of the RF Diode Sputter Deposition of GMR Thin Films, Application notes, 2000. |
| Control of Sputter Process for Improved Run-to-run Repeatability | |
|
S. Ghosal, R. L. Kosut, J. L. Ebert, L. Porter, D. Brownell, and D. Wang, Control of Sputter Process for Improved Run-to-run Repeatability, S. C. Application Notes, 2000. |
| Reactor-scale Modeling and Control for MOCVD of YBCO High Temperature Superconductors | |
|
Reactor-scale Modeling and Control for MOCVD of YBCO High Temperature Superconductors, Application Notes, SC Solutions, Inc., 1999. |
| A Physical Model for Drying of Gelcast Ceramics | |
|
S. Ghosal, A. Emami-Naeini, Y. P. Harn, B. Draskovich, and J. P. Pollinger, A Physical Model for Drying of Gelcast Ceramics, Journal of the American Ceramic Society, Vol. 82, No. 3, pp. 513-520, 1999. |
| Real-Time Model-Based Control Systems Design for Gelcast Drying Process | |
|
Y. P. Harn, S. Ghosal, G. Aral, A. Emami-Naeini, B. Draskovich, and L. C. Maxey, Real-Time Model-Based Control Systems Design for Gelcast Drying Process, Proceedings of the 1997 IEEE International Conference on Control Applications, Hartford, CT. October 5-7, 1997. |
Aerospace
Energy
Mechatronics
Medical
Semiconductor
| Control in Semiconductor Wafer Manufacturing | |
|
Abbas Emami-Naeini, Dick de Roover, Control in Semiconductor Wafer Manufacturing, 47th IEEE Conference on Decision and Control, Cancun, Mexico, December 9-11, 2008. |
| Model-Based Control and Virtual Sensing with Application to a Vertical Furnace | |
|
J. L. Ebert, N. Acharya, D. de Roover, A. Emami-Naeini, R. L. Kosut, J. Zhang, Model-Based Control and Virtual Sensing with Application to a Vertical Furnace, AEC/APC Symposium, Salt Lake City, Utah, 2008. |
| Optimal control of quantum gates and suppression of decoherence in a system of interacting two-level particles | |
|
Matthew Grace, Constantin Brif, Herschel Rabitz, Ian A. Walmsley, Robert L. Kosut, Daniel A. Lidar, Optimal control of quantum gates and suppression of decoherence in a system of interacting two-level particles, arXiv:quant-ph/0702147v2, J. Phys. B: At. Mol. Opt. Phys. 40, S103-S125 (2007) |
| Model-based control of rapid thermal processing for semiconductor wafers | |
|
Ebert, J.L.; de Roover, D.; Porter, L.L., II; Lisiewicz, V.A.; Ghosal, S.; Kosut, R.L.; Emami-Naeini, A.; Model-based control of rapid thermal processing for semiconductor wafers, Proceedings of the 2004 American Control Conference, page(s): 3910 - 3921 vol.5, 2004. |
| Model-based control for semiconductor and advanced materials processing: an overview | |
|
A. Emami-Naeini, J.L. Ebert, R.L. Kosut, D. de Roover, S. Ghosal, Model-based control for semiconductor and advanced materials processing: an overview, Proceedings of the 2004 American Control Conference, 30 June -2 July 2004, page(s): 3902 - 3909 vol.5, 2004. |
| Model-based control for chemical-mechanical planarization (CMP) | |
|
de Roover, D.; Emami-Naeini, A.; Ebert, J.L., Model-based control for chemical-mechanical planarization (CMP), Proceedings of the 2004 American Control Conference, Volume 5, 30 June-2 July 2004, pp. 3922-3929, 2004. |
| Modeling and Control of Distributed Thermal Systems | |
|
A. Emami-Naeini, J. L. Ebert, D. de Roover, R. L. Kosut, M. Dettori, L. M. Porter, S. Ghosal, Modeling and control of distributed thermal systems, IEEE Transactions on Control Systems Technology, Volume 11, Issue 5, Page(s):668 - 683, Sept. 2003. |
| Multi-Scale Model of the RF Diode Sputter Deposition of GMR Thin Films | |
|
S. Ghosal, R. L. Kosut, J. L. Ebert, A. Kozak, T. E. Abrahamson, W. Zou, X. W. Zhou, J. F. Groves, Y. G. Yang, H. N. G. Wadley, D. Brownell, and D. Wang, Multi-Scale Model of the RF Diode Sputter Deposition of GMR Thin Films, Application notes, 2000. |
| Command Shaping for MIMO Nonlinear Systems Using Iterative Learning Control with Application to an RTP System | |
|
D. de Roover, A. Emami-Naeini, J. L. Ebert, R. L. Kosut, Command Shaping for MIMO Nonlinear Systems Using Iterative Learning Control with Application to an RTP System, Proceedings of the ASME Dynamic Systems and Control Divison-2000, pp. 153-161, November 2000. |
| Control of Sputter Process for Improved Run-to-run Repeatability | |
|
S. Ghosal, R. L. Kosut, J. L. Ebert, L. Porter, D. Brownell, and D. Wang, Control of Sputter Process for Improved Run-to-run Repeatability, S. C. Application Notes, 2000. |
| Feedback Control of Morphology During III-V Semiconductor Growth by Molecular Beam Epitaxy | |
|
R. L. Kosut, R. Caflisch, M. Gyure, D. G. Meyer, A. Engelmann, Feedback Control of Morphology During III-V Semiconductor Growth by Molecular Beam Epitaxy, Proceedings of the 38th Conference on Decision & Control, Phoenix, AZ, December 1999, pp. 4204-4208. |
| Tradeoffs in Temperature Control of Fast-Ramp RTO and RTA Systems | |
|
D. de Roover, A. Emami-Naeini, J. L. Ebert, R. L. Kosut, Tradeoffs in Temperature Control of Fast-Ramp RTO and RTA Systems, Proceedings of the Seventh International Conference on Advanced Thermal Processing of Semiconductors, RTP '99, Colorado Springs, September 1999. |
| Silicon Epitaxy White Paper | |
|
SC Solutions, Inc., "Reactor-scale Model of Silicon Epitaxy Process", Application Notes, 1999. |
| Model-based Control of MOCVD Rate, Uniformity and Stoichiometry | |
|
S. Ghosal, J. L. Ebert, D. de Roover, and A. Emami-Naeini, Model-based Control of MOCVD Rate, Uniformity and Stoichiometry, Presented at the Third Symposium of Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing, 195th Meeting of the Electrochemical Society, Seattle, May 2-6, 1999. |
| Run-to-Run Control of Static Systems | |
|
D. de Roover, R. L. Kosut, A. Emami-Naeini, and J. L. Ebert, Run-to-Run Control of Static Systems, Proceedings of the 37th IEEE Conference on Decision and Control, pp. 695-700, Tampa, Florida, December, 1998. |
| Linear Multivariable Servomechanisms Revisited: System Type and Accuracy Trade-offs | |
|
B. A. L. de la Barra, A. Emami-Naeini, and E. R. Chinchon, Linear Multivariable Servomechanisms Revisited: System Type and Accuracy Trade-offs, Automatica, Vol. 34, No. 11, pp. 1449-1452, 1998. |
| Model-Based Control of Fast-Ramp RTP Systems | |
|
D. de Roover, A. Emami-Naeini, J. L. Ebert, S. Ghosal, and G. W. van der Linden, Model-Based Control of Fast-Ramp RTP Systems, Proceedings of the Sixth International Conference on Advanced Thermal Processing of Semiconductors, RTP '98, Kyoto, Japan, September 9-11, 1998. |
| Efficient CFD Modeling of Single Wafer Semiconductor Systems for Closed-Loop Evaluation | |
|
J. L. Ebert, G. W. van der Linden, R. L. Kosut, and A. Emami-Naeini, Efficient CFD Modeling of Single Wafer Semiconductor Systems for Closed-Loop Evaluation, Proceedings of the 36th IEEE Conference on Decision and Control, pp. 830-831, December, 1997. |
| Efficient CFD Modeling of Single Wafer System for Closed-Loop Evaluation | |
|
J. L. Ebert, G. W. van der Linden, R. L. Kosut, and A. Emami-Naeini, Efficient CFD Modeling of Single Wafer System for Closed-Loop Evaluation, Proceedings of the Fifth International Conference on Advanced Thermal Processing of Semiconductors, RTP '97, New Orleans, LA, September 3-5, 1997. |