General finite element models of single wafer systems that describe both the dynamics of the solids as well as the gases are usually unsuited for quick design iterations, because of the computational complexity. In this paper a computationally more efficient alternative is proposed. The solids can be modeled efficiently and sufficiently accurate using a finite volume approach. The gases are modeled by finite element CFD software, and are approximated by a static map by iteratively coupling the solids model to the CFD finite element model. The static gas model can then be coupled directly to the finite volume solids model.
Efficient CFD Modeling of Single Wafer System for Closed-Loop Evaluation
J. L. Ebert, G. W. van der Linden, R. L. Kosut, and A. Emami-Naeini
Proceedings of the Fifth International Conference on Advanced Thermal Processing of Semiconductors, RTP '97, New Orleans, LA, September 3-5, 1997.